Analytical evaluation of thermally oxidized and deposited dielectric in NMOS-PMOS devices

Weng, MH; Idris, MI; Chan, HK; Murphy, AE; Smith, DA; Clark, DT; Young, RAR; Ramsay, EP; Horsfall, AB

doi:10.4028/www.scientific.net/MSF.858.631

Analytical evaluation of thermally oxidized and deposited dielectric in NMOS-PMOS devices

Lookup NU author(s): Dr Ming-Hung Weng, Idris Idris, Dr Hua Khee Chan, Dr Alton Horsfall

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Abstract

© 2016 Trans Tech Publications, Switzerland. We demonstrate the influence of enhancing the dielectric film used to form the gate in complimentary MOS circuits, designed for high temperature operation. The data show that the characteristics of both n-MOS and p-MOS capacitors and transistors have degraded capacitance characteristics in terms of the trapped charge in the dielectric, although the interface state density is dictated by the underlying stub oxide, at around 5×1012 cm-2eV-1. The use of a deposited oxide also reduces the variability in the critical electric field in the oxide, whilst maintaining a value of approximately 10MV cm-1. The channel mobility extracted from n-and p-MOS transistors fabricated alongside the capacitors showed similar values, of approximately 3.8 cm2V-1s-1, which are limited by the high doping level in the epilayers used in this study.