Browsing publications by Luke Driscoll

Newcastle AuthorsTitleYear
Goutan Dalapati
Dr Sanatan Chattopadhyay
Luke Driscoll
Professor Anthony O'Neill
Dr Kelvin Kwa
et al.
Extraction and modelling of strained-Si MOSFET parameters using small signal channel conductance method2006
Goutan Dalapati
Dr Sanatan Chattopadhyay
Luke Driscoll
Professor Anthony O'Neill
Dr Kelvin Kwa
et al.
Extraction of strained-Si metal-oxide-semiconductor field-effect transistor parameters using small signal channel conductance method2006
Goutan Dalapati
Dr Kelvin Kwa
Dr Sarah Olsen
Dr Sanatan Chattopadhyay
Professor Anthony O'Neill
et al.
Thermal oxidation of strained-Si: impact of strained-Si thickness and Ge on Si/SiO2 interface2006
Dr Sarah Olsen
Professor Anthony O'Neill
Dr Sanatan Chattopadhyay
Dr Kelvin Kwa
Luke Driscoll
et al.
Doubling speed using strained Si/SiGe CMOS technology2005
Dr Kelvin Kwa
Dr Sarah Olsen
Professor Anthony O'Neill
Dr Sanatan Chattopadhyay
Goutan Dalapati
et al.
Fowler-Nordheim tunnelling in strained Si/SiGe MOS devices: impact of cross-hatching and nanoscale roughness2005
Dr Sarah Olsen
Luke Driscoll
Dr Kelvin Kwa
Dr Sanatan Chattopadhyay
Professor Anthony O'Neill
et al.
High performance strained Si.SiGe n-channel MOSFETs: impact of alloy composition and layer architecture2005
Dr Sarah Olsen
Professor Anthony O'Neill
Dr Piotr Dobrosz
Professor Steve Bull
Luke Driscoll
et al.
Study of strain relaxation in Si/SiGe metal-oxide-semiconductor field-effect transistors2005
Dr Sarah Olsen
Dr Kelvin Kwa
Luke Driscoll
Dr Sanatan Chattopadhyay
Professor Anthony O'Neill
et al.
Design, fabrication and characterisation of strained Si/SiGe MOS transistors2004
Dr Sarah Olsen
Professor Anthony O'Neill
Dr Sanatan Chattopadhyay
Dr Kelvin Kwa
Luke Driscoll
et al.
Evaluation of strained Si/SiGe material for high performance CMOS2004
Dr Sarah Olsen
Professor Anthony O'Neill
Dr Sanatan Chattopadhyay
Dr Kelvin Kwa
Luke Driscoll
et al.
Evaluation of strained Si/SiGe material for high performance CMOS2004
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