High performance strained Si.SiGe n-channel MOSFETs: impact of alloy composition and layer architecture

  1. Lookup NU author(s)
  2. Dr Sarah Olsen
  3. Luke Driscoll
  4. Dr Kelvin Kwa
  5. Dr Sanatan Chattopadhyay
  6. Professor Anthony O'Neill
Author(s)Olsen SH, Driscoll L, Kwa K, Chattopadhyay S, O'Neill AG
Editor(s)
Publication type Conference Proceedings (inc. Abstract)
Conference NameInternational Conference on Solid State Devices and Materials (SSDM)
Conference LocationTokyo, Japan
Year of Conference2005
Date12-15 September 2005
Volume
Pages722-723
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