Thermal oxidation of strained-Si: impact of strained-Si thickness and Ge on Si/SiO2 interface

  1. Lookup NU author(s)
  2. Goutan Dalapati
  3. Dr Kelvin Kwa
  4. Dr Sarah Olsen
  5. Dr Sanatan Chattopadhyay
  6. Professor Anthony O'Neill
  7. Luke Driscoll
  8. Dr Yuk Tsang
  9. Rimoon Agaiby
  10. Dr Enrique Escobedo-Cousin
Author(s)Dalapati GK, Kwa KSK, Olsen SH, Chattopadhyay S, O'Neill AG, Driscoll LS, Tsang YL, Agaiby R, Escobedo-Cousin E
Editor(s)
Publication type Conference Proceedings (inc. Abstract)
Conference NameInternational Conference on Electronic and Photonic Material, Devices and Systems (EPMDS)
Conference LocationCalcutta, India
Year of Conference2006
Legacy Date4-6 January 2006
Volume
Pages
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