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Analysis of gate leakage characteristics in strained Si MOSFETs
Lookup NU author(s)
Liang Yan
Dr Sarah Olsen
Dr Mehdi Kanoun
Rimoon Agaiby
Goutan Dalapati
Professor Anthony O'Neill
Author(s)
Yan L, Olsen S, Kanoun M, Al-Araimi M, Agaiby R, Dalapati G, O'Neill A
Editor(s)
Publication type
Conference Proceedings (inc. Abstract)
Conference Name
210th ECS Meeting
Conference Location
Cancun, Mexico
Year of Conference
2006
Date
29 October-3 November 2006
Volume
Pages
Full text for this publication is not currently held within this repository. Alternative links are provided below where available.
Publisher
The Electrochemical Society
URL
http://www.electrochem.org/meetings/biannual/210/210.htm
Notes
Abstract 1501