Statistical modelling of the variation in advanced process technologies using a multi-level partitioned response surface approach

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Author(s)Shedabale S, Ramakrishnan H, Russell G, Yakovlev A, Chattopadhyay S
Publication type Article
JournalIET Circuits, Devices and Systems
Year2008
Volume2
Issue5
Pages451-464
ISSN (print)1751-858X
ISSN (electronic)1751-8598
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PublisherThe Institution of Engineering and Technology
URLhttp://dx.doi.org/10.1049/iet-cds:20080031
DOI10.1049/iet-cds:20080031
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