Post Metallization Annealing Characterization of Interface Properties of High-kappa Dielectrics Stack on Silicon Carbide

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  2. Dr Ming-Hung Weng
  3. Dr Rajat Mahapatra
  4. Professor Nick Wright
  5. Dr Alton Horsfall
Author(s)Weng MH, Mahapatra R, Wright NG, Horsfall AB
Editor(s)Suzuki, A; Okumura, H; Kimoto, T; Fuyuki, T; Fukuda, K; Nishizawa, S
Publication type Conference Proceedings (inc. Abstract)
Conference Name12th International Conference on Silicon Carbide and Related Materials (ICSCRM 2007)
Conference LocationLake Biwa Resort, Otsu, Japan
Year of Conference2007
Source Publication Date14-19 October 2007
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PublisherMaterials Science Forum: Trans Tech Publications Ltd
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