Nanoscale strain characterisation for ultimate CMOS and beyond

  1. Lookup NU author(s)
  2. Dr Sarah Olsen
  3. Dr Piotr Dobrosz
  4. Rouzet Agaiby
  5. Dr Yuk Tsang
  6. Layi Alatise
  7. Professor Steve Bull
  8. Professor Anthony O'Neill
Author(s)Olsen SH, Dobrosz P, Agaiby RMB, Tsang YL, Alatise O, Bull SJ, O'Neill AG, Moselund KE, Ionescu AM, Majhi P, Buca D, Mantl S, Coulson H
Editor(s)Claeys C; Peaker T; Fompeyrine J; Frank M; Vanhellemont J
Publication type Conference Proceedings (inc. Abstract)
Conference NameE-MRS 2008 Spring Meeting
Conference LocationStrasbourg
Year of Conference2008
Date26-30 May 2008
Volume11, issues 5-6
Pages271-278
ISBN
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PublisherMaterials Science in Semiconductor Processing: Pergamon
URLhttp://dx.doi.org/10.1016/j.mssp.2009.06.003
DOI10.1016/j.mssp.2009.06.003
NotesSymposium J: Beyond Silicon Technology: Materials and Devices for Post-Si CMOS Invited presentation
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