In situ X-ray diffraction study of self-forming barriers from a Cu-Mn alloy in 100 nm Cu/Iow-k damascene interconnects using synchrotron radiation

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  2. Dr Alton Horsfall
  3. Professor Anthony O'Neill
Author(s)Wilson CJ, Volders H, Croes K, Pantouvaki M, Beyer GP, Horsfall AB, O'Neill AG, Tokei Z
Editor(s)
Publication type Conference Proceedings (inc. Abstract)
Conference NameMicroelectronic Engineering: 18th European Workshop on Materials for Advanced Metallization
Conference LocationGrenoble, France
Year of Conference2010
Date8-11 March 2009
Volume87, 3
Pages398-401
ISBN18735568
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PublisherElsevier BV
URLhttp://dx.doi.org/10.1016/j.mee.2009.06.023
DOI10.1016/j.mee.2009.06.023
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