Silicon nanowires with lateral uniaxial tensile stress profiles for high electron mobility gate-all-around MOSFETs

  1. Lookup NU author(s)
  2. Dr Piotr Dobrosz
  3. Dr Sarah Olsen
Author(s)Najmzadeh M, De Michielis L, Bouvet D, Dobrosz P, Olsen S, Ionescu AM
Editor(s)
Publication type Conference Proceedings (inc. Abstract)
Conference NameMicroelectronic Engineering: 35th International Conference on Micro and Nano Engineering
Conference LocationGhent, Belgium
Year of Conference2010
Legacy Date28 September - 1 October 2009
Volume87, 5-8
Pages1561-1565
ISBN18735568
Full text for this publication is not currently held within this repository. Alternative links are provided below where available.
PublisherElsevier
URLhttp://dx.doi.org/10.1016/j.mee.2009.11.024
DOI10.1016/j.mee.2009.11.024
ActionsLink to this publication
Library holdingsSearch Newcastle University Library for this item