Post metallization annealing characterization of interface properties of high-K dielectrics stack on silicon carbide
- Lookup NU author(s)
- Ming-Hung Weng
- Dr Rajat Mahapatra
- Professor Nick Wright
- Dr Alton Horsfall
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| Author(s) | | Weng MH, Mahapatra R, Wright NG, Horsfall AB |
| Editor(s) | | Suzuki, A., Okumura, H., Kimoto, T., Fuyuki, T., Fukuda, K., Nishizawa, S. |
| Publication type | | Conference Proceedings (inc. Abstract) |
| Conference Name | | 12th International Conference on Silicon Carbide and Related Materials (ICSCRM 2007) |
| Conference Location | | Otsu, Japan |
| Year of Conference | | 2009 |
| Date | | 14-19 October 2007 |
| Volume | | 600-603 |
| Pages | | 771-774 |
| | 02555476 |
| ISBN | | 14226375 |
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| Full text for this publication is not currently held within this repository. Alternative links are provided below where available. |
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| Publisher | | Materials Science Forum: Trans Tech Publications Ltd |
| URL | | http://dx.doi.org/10.4028/www.scientific.net/MSF.600-603.771 |
| DOI | | 10.4028/www.scientific.net/MSF.600-603.771 |
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