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Lookup NU author(s): Dr Rajat Mahapatra, Dr Alton Horsfall, Professor Nick Wright
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In this study we report interface and carrier transport behaviour in Al/HfO2/SiO2/SiC MIS structure. The density of the interface states (Dit) and the oxide trapped charges (Not) are found to be ∼7 × 1011 eV-1cm-2 @ Ec-Et = 0.2 eV, and ∼ 4.8 × 1011 cm-2. The temperature dependencies on gate current density are explored to study the different charge transport mechanisms through the HfO 2-based dielectric stack on 4H-SiC. In the low voltage region, the conduction mechanism is controlled by a space charge limited or electronic hopping conduction process. Beyond this region (1.25 MV/cm 2.5 MV/cm), and at higher temperatures Schottky emission (SE) fits the data very well. The barrier height is found to be ∼1.5 eV, which is higher than the value for just HfO2 on SiC © (2009) Trans Tech Publications, Switzerland.
Author(s): Mahapatra R, Horsfall AB, Wright NG
Editor(s): Suzuki, A., Okumura, H., Kimoto, T., Fuyuki, T., Fukuda, K., Nishizawa, S.
Publication type: Conference Proceedings (inc. Abstract)
Publication status: Published
Conference Name: 12th International Conference on Silicon Carbide and Related Materials (ICSCRM 2007)
Year of Conference: 2009
Pages: 759-762
ISSN: 0255-5476
Publisher: Materials Science Forum: Trans Tech Publications Ltd
URL: .10.4028/www.scientific.net/MSF.600-603.759
DOI: 10.4028/www.scientific.net/MSF.600-603.759
Library holdings: Search Newcastle University Library for this item
ISBN: 14226375
