Impact of interfacial nitridation of HfO2 high-k gate dielectric stack on 4H-SiC

  1. Lookup NU author(s)
  2. Dr Rajat Mahapatra
  3. Peter Tappin
  4. Bing Miao
  5. Dr Alton Horsfall
  6. Dr Sanatan Chattopadhyay
  7. Professor Nick Wright
Author(s)Mahapatra R, Chakraborty A, Tappin P, Miao B, Horsfall A, Chattopadhyay S, Wright N, Coleman K
Editor(s)
Publication type Conference Proceedings (inc. Abstract)
Conference NameMaterials Research Society Symposium Proceedings: Characterization of Oxide/Semiconductor Interfaces for CMOS Technologies (MRS Spring Meeting)
Conference LocationSan Francisco, California, USA
Year of Conference2007
Date9-13 April 2007
Volume996
Pages163-168
02729172
ISBN9781605604282
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