Impact of interfacial nitridation of HfO2 high-k gate dielectric stack on 4H-SiC
- Lookup NU author(s)
- Dr Rajat Mahapatra
- Peter Tappin
- Bing Miao
- Dr Alton Horsfall
- Dr Sanatan Chattopadhyay
- Professor Nick Wright
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| Author(s) | | Mahapatra R, Chakraborty A, Tappin P, Miao B, Horsfall A, Chattopadhyay S, Wright N, Coleman K |
| Editor(s) | | |
| Publication type | | Conference Proceedings (inc. Abstract) |
| Conference Name | | Materials Research Society Symposium Proceedings: Characterization of Oxide/Semiconductor Interfaces for CMOS Technologies (MRS Spring Meeting) |
| Conference Location | | San Francisco, California, USA |
| Year of Conference | | 2007 |
| Date | | 9-13 April 2007 |
| Volume | | 996 |
| Pages | | 163-168 |
| | 02729172 |
| ISBN | | 9781605604282 |
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