Nanoscale strain characterisation for ultimate CMOS and beyond

  1. Lookup NU author(s)
  2. Dr Sarah Olsen
  3. Dr Piotr Dobrosz
  4. Rouzet Agaiby
  5. Dr Yuk Tsang
  6. Layi Alatise
  7. Professor Steve Bull
  8. Professor Anthony O'Neill
Author(s)Olsen S, Dobrosz P, Agaiby R, Tsang Y, Alatise O, Bull S, O'Neill A, Moselund K, Ionescu A, Majhi P, Buca D, Mantl S, Coulson H
Publication type Article
JournalMaterials Science in Semiconductor Processing
Year2008
Volume11
Issue5
Pages271-278
ISSN (print)1369-8001
ISSN (electronic)1873-4081
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PublisherPergamon
URLhttp://dx.doi.org/10.1016/j.mssp.2009.06.003
DOI10.1016/j.mssp.2009.06.003
NotesE-MRS 2008 Spring Conference Symposium J: Beyond Silicon Technology: Materials and Devices for Post-Si CMOS
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