In situ X-ray diffraction study of self-forming barriers from a Cu-Mn alloy in 100 nm Cu/low-k damascene interconnects using synchrotron radiation

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  2. Dr Alton Horsfall
  3. Professor Anthony O'Neill
Author(s)Wilson C, Volders H, Croes K, Pantouvaki M, Beyer G, Horsfall A, O'Neill A, Tokei Z
Publication type Article
JournalMicroelectronic Engineering
Year2010
Volume87
Issue3
Pages398-401
ISSN (print)0167-9317
ISSN (electronic)1873-5568
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PublisherElsevier BV
URLhttp://dx.doi.org/10.1016/j.mee.2009.06.023
DOI10.1016/j.mee.2009.06.023
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