Atomic layer deposition of Ti-HfO2 dielectrics

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Author(s)Werner M, King PJ, Hindley S, Romani S, Mather S, Chalker PR, Williams PA, van den Berg JA
Publication type Article
JournalJournal of Vacuum Science & Technology A
Year2013
Volume31
Issue1
Pages
ISSN (print)1071-8028
ISSN (electronic)1944-2807
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PublisherAmerican Institute of Physics
URLhttp://dx.doi.org/10.1116/1.4748570
DOI10.1116/1.4748570
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