Gate Oxide Reliability on strained Si/SiGe MOS: Effect of Ge content variation
- Lookup NU author(s)
- Dr Suresh Uppal
- John Varzgar
- Dr Mehdi Kanoun
- Dr Sanatan Chattopadhyay
- Dr Sarah Olsen
- Professor Anthony O'Neill
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| Author(s) | | Uppal S, Varzgar JB, Kanoun M, Chattopadhyay S, Olsen SH, O'Neill AG |
| Editor(s) | | |
| Publication type | | Conference Proceedings (inc. Abstract) |
| Conference Name | | Materials Science and Engineering B: Advanced Functional Solid-state Materials. E-MRS Conference |
| Conference Location | | Nice, France |
| Year of Conference | | 2006 |
| Date | | 29 May - 2 June 2006 |
| Volume | | 135 (3) |
| Pages | | 207-209 |
| ISBN | | 18734944 |
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| Full text for this publication is not currently held within this repository. Alternative links are provided below where available. |
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| Publisher | | Elsevier SA |
| Actions | |  |
| Library holdings | | Search Newcastle University Library for this item |
