Modeling Dopant Diffusion in Strained and Strain-Relaxed Epi-SiGe
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- Dr Shibin Liu
- Professor Nick Cowern
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| Author(s) | | Sheu YM, Huang TY, Hu YP, Wang CC, Liu S, Duffy R, Heringa A, Roozeboom F, Cowern NEB, Griffin PB |
| Editor(s) | | |
| Publication type | | Conference Proceedings (inc. Abstract) |
| Conference Name | | International Conference on Simulation of Semiconductor Processes and Devices |
| Conference Location | | Tokyo, Japan |
| Year of Conference | | 2005 |
| Date | | 1-3 September 2005 |
| Volume | | |
| Pages | | 75-78 |
| ISBN | | 4990276205 |
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| Full text for this publication is not currently held within this repository. Alternative links are provided below where available. |
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| Publisher | | IEEE |
| URL | | http://dx.doi.org/10.1109/SISPAD.2005.201476 |
| DOI | | 10.1109/SISPAD.2005.201476 |
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| Library holdings | | Search Newcastle University Library for this item |
