Design, fabrication and characterisation of strained Si/SiGe MOS transistors

  1. Lookup NU author(s)
  2. Dr Sarah Olsen
  3. Dr Kelvin Kwa
  4. Luke Driscoll
  5. Dr Sanatan Chattopadhyay
  6. Professor Anthony O'Neill
Author(s)Olsen SH, Kwa KSK, Driscoll LS, Chattopadhyay S, O'Neill AG
Publication type Article
JournalIEE Proceedings: Circuits, Devices and Systems
Year2004
Volume151
Issue5
Pages431-437
ISSN (print)1350-2409
ISSN (electronic)1751-8598
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PublisherThe Institution of Engineering and Technology
URLhttp://dx.doi.org/10.1049/ip-cds:20040995
DOI10.1049/ip-cds:20040995
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