Doubling speed using strained Si/SiGe CMOS technology

  1. Lookup NU author(s)
  2. Dr Sarah Olsen
  3. Professor Anthony O'Neill
  4. Dr Sanatan Chattopadhyay
  5. Dr Kelvin Kwa
  6. Luke Driscoll
Author(s)Olsen SH, Temple M, O'Neill AG, Paul DJ, Chattopadhyay S, Kwa KSK, Driscoll LS
Editor(s)S. Zaima, S. Miyazaki, S. Takagi, M. Miyao, J. Murota
Publication type Conference Proceedings (inc. Abstract)
Conference NameFourth International Conference on Silicon Epitaxy and Heterostructures (ICSI-4)
Conference LocationAwaji Island, Hyogo, Japan
Year of Conference2005
Date23-26 May 2005
Volume508, issues 1-2
Pages338-341
00406090
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PublisherThin Solid Films: Elsevier
URLhttp://dx.doi.org/10.1016/j.tsf.2005.07.347
DOI10.1016/j.tsf.2005.07.347
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