A study of boron implantation into high Ge content SiGe alloys
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- Dr Suresh Uppal
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| Author(s) | | Wittmann R, Uppal S, Hossinger A, Cervenka J, Selberherr S |
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| Publication type | | Conference Proceedings (inc. Abstract) |
| Conference Name | | ECS Transactions: 210th ECS Meeting |
| Conference Location | | Cancun, Mexico |
| Year of Conference | | 2006 |
| Date | | 29 October - 3 November 2006 |
| Volume | | 3, 7 |
| Pages | | 667-676 |
| ISBN | | 19386737 |
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| Full text for this publication is not currently held within this repository. Alternative links are provided below where available. |
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| Publisher | | Electrochemical Society, Inc. |
| URL | | http://dx.doi.org/10.1149/1.2355862 |
| DOI | | 10.1149/1.2355862 |
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| Library holdings | | Search Newcastle University Library for this item |
