A study of boron implantation into high Ge content SiGe alloys

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  2. Dr Suresh Uppal
Author(s)Wittmann R, Uppal S, Hossinger A, Cervenka J, Selberherr S
Editor(s)
Publication type Conference Proceedings (inc. Abstract)
Conference NameECS Transactions: 210th ECS Meeting
Conference LocationCancun, Mexico
Year of Conference2006
Date29 October - 3 November 2006
Volume3, 7
Pages667-676
ISBN19386737
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PublisherElectrochemical Society, Inc.
URLhttp://dx.doi.org/10.1149/1.2355862
DOI10.1149/1.2355862
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