Energy-band alignment of HfO2/SiO2/SiC gate dielectric stack

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  2. Dr Rajat Mahapatra
  3. Dr Alton Horsfall
  4. Professor Nick Wright
Author(s)Mahapatra R, Chakraborty AK, Horsfall AB, Wright NG, Beamson G, Coleman KS
Publication type Article
JournalApplied Physics Letters
Year2008
Volume92
Issue4
Pages
ISSN (print)0003-6951
ISSN (electronic)1077-3118
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PublisherAmerican Institute of Physics
URLhttp://dx.doi.org/10.1063/1.2839314
DOI10.1063/1.2839314
NotesArticle no. 042904 3 pages
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