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Thermal oxidation of strained Si/SiGe: impact of surface morphology and effect on MOS devices

Lookup NU author(s): Dr Sarah Olsen, Professor Anthony O'Neill, Professor Steve Bull, Dr Sanatan Chattopadhyay, Dr Kelvin Kwa, Luke Driscoll

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Author(s): Olsen SH, O'Neill AG, Norris DJ, Cullis AG, Bull SJ, Chattopadhyay S, Kwa KSK, Driscoll LS, Waite AM, Tang YT, Evans AGR

Publication type: Article

Publication status: Published

Journal: Materials Science and Engineering B

Year: 2004

Volume: 109

Issue: 1-3

Pages: 78-84

ISSN (print): 0921-5107

ISSN (electronic): 1873-4944

Publisher: Elsevier SA

URL: http://dx.doi.org/10.1016/j.mseb.2003.10.051

DOI: 10.1016/j.mseb.2003.10.051

Notes: Paper presented at: EMRS 2003, Symposium I, Functional Metal Oxides - Semiconductor Structures, Strasbourg, 10-13 June 2003


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