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Nanoscale strain characterisation for ultimate CMOS and beyond

Lookup NU author(s): Dr Sarah Olsen, Dr Piotr Dobrosz, Rouzet Agaiby, Dr Yuk Tsang, Layi Alatise, Professor Steve Bull, Professor Anthony O'Neill


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Publication metadata

Author(s): Olsen SH, Dobrosz P, Agaiby RMB, Tsang YL, Alatise O, Bull SJ, O'Neill AG, Moselund KE, Ionescu AM, Majhi P, Buca D, Mantl S, Coulson H

Editor(s): Claeys C; Peaker T; Fompeyrine J; Frank M; Vanhellemont J

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: E-MRS 2008 Spring Meeting

Year of Conference: 2008

Pages: 271-278

ISSN: 1369-8001

Publisher: Materials Science in Semiconductor Processing: Pergamon


DOI: 10.1016/j.mssp.2009.06.003

Notes: Symposium J: Beyond Silicon Technology: Materials and Devices for Post-Si CMOS Invited presentation

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