Lookup NU author(s): Dr Sarah Olsen,
Professor Anthony O'Neill
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The performance of surface channel MOSFET devices is dependent on the Si/SiO2 interface roughness. This paper examines the performance demonstrated by strained Si/SiGe heterojunction n-channel MOSFET devices (HNMOSFETs) fabricated on ultra-low pressure CVD (ULPCVD) material compared with unstrained Si control devices. The surface channel HNMOSFETs were found to exhibit performance enhancements in terms of transconductance of approximately 135% compared with their Si counterparts. In addition, the electrical characteristics of the HNMOSFETs displayed increased uniformity and improvements in the peak transconductance in excess of 75% compared with equivalent devices fabricated on strained Si/SiGe GS-MBE material. Atomic force microscopy and transmission electron microscopy showed that the favourable characteristics of the ULPCVD strained Si/SiGe devices are due to reduced cross-hatch severity of the ULPCVD material, which is shown to decrease nanoscale roughness at the Si/SiO2 interface.
Author(s): Olsen SH, O'Neill AG, Norris DJ, Cullis AG, Fobelets K, Kemhadjian HA
Publication type: Article
Publication status: Published
Journal: Solid State Electronics
ISSN (print): 0038-1101
ISSN (electronic): 1879-2405
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