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Plasma-based chemical modification of epitaxial graphene with oxygen functionalities

Lookup NU author(s): Karthik Nagareddy

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Abstract

Epitaxial graphene is promising material for future graphene-based applications including high frequency devices and chemical/biological sensors. Modifying the surface chemistry of graphene allows one to control its properties and thus provides a promising route towards further broadening the device application space for this unique material. Herein, we demonstrate the use of electron beam generated plasmas as a route towards controlled oxygen doping of epitaxial graphene. X-ray photoelectron spectroscopy, Raman spectroscopy and electrical measurements are used to track the oxygen incorporation and its influence on the structural and electrical properties of epitaxial graphene. (C) 2013 Elsevier B.V. All rights reserved.


Publication metadata

Author(s): Hernandez SC, Wheeler VD, Osofsky MS, Jernigan GG, Nagareddy V, Nath A, Lock EH, Nyakiti LO, Myers-Ward RL, Sridhara K, Horsfall AB, Eddy CR, Gaskill DK, Walton SG

Publication type: Article

Publication status: Published

Journal: Surface and Coatings Technology

Year: 2014

Volume: 241

Pages: 8-12

Print publication date: 16/11/2013

ISSN (print): 0257-8972

ISSN (electronic): 1879-3347

Publisher: Elsevier S.A.

URL: http://dx.doi.org/10.1016/j.surfcoat.2013.11.015

DOI: 10.1016/j.surfcoat.2013.11.015


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