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Nitrogen as a Suitable Replacement for Argon within Methane‐Based Hot‐Wall Graphene Chemical Vapor Deposition

Lookup NU author(s): Dr Johannes Gausden, Dr Toby Hallam

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Abstract

Of the gases frequently used during graphene chemical vapor deposition (CVD),argon plays no direct chemical role and therefore may be suitable for substitutionwith the cheaper alternative of nitrogen. The impact of using nitrogen as a carriergas in methane-based hot-wall graphene CVD is investigated using Ramanspectroscopy, X-ray photoelectron spectroscopy, and time-of-flight secondary ionmass spectroscopy. No increase in the nitrogen signal is observed within gra-phene grown within a nitrogen atmosphere within the detection limits of thespectroscopic techniques used.


Publication metadata

Author(s): Gausden J, Siris T, Stimpel-Lindner T, McEvoy N, Duesberg GS, Hallam T

Publication type: Article

Publication status: Published

Journal: physica status solidi (b)

Year: 2019

Volume: 256

Issue: 12

Print publication date: 18/08/2019

Online publication date: 25/07/2019

Acceptance date: 09/08/2019

ISSN (print): 0370-1972

ISSN (electronic): 1521-3951

Publisher: Wiley

URL: https://doi.org/10.1002/pssb.201900240

DOI: 10.1002/pssb.201900240


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