Lookup NU author(s): Professor Patrick Briddon
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The electrical activity of Cs-H defects in Si has been investigated in a combined modeling and experimental study. High-resolution Laplace capacitance spectroscopy with the uniaxial stress technique has been used to measure the stress-energy tensor and the results are compared with the theoretical modeling. At low temperatures, implanted H is trapped as a negative-U center with a donor level in the upper half of the gap. However, at higher temperatures, H migrates closer to the carbon impurity and the donor level falls, crossing the gap. At the same time, an acceptor level is introduced into the upper gap making the defect a positive-U center.
Author(s): Briddon PR; Andersen O; Peaker AR; Dobaczewski L; Nielsen KB; Hourahine B; Jones R; Oberg S
Publication type: Article
Publication status: Published
Journal: Physical Review B: Condensed Matter and Materials Physics
ISSN (print): 0163-1829
Publisher: American Physical Society
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