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Effect of metal-oxide-semiconductor processing on the surface rouhness of strained Si/SiGe material

Lookup NU author(s): Dr Sarah Olsen, Professor Anthony O'Neill, Professor Steve Bull

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This is the final published version of an article that has been published in its final definitive form by American Institute of Physics, 2002.

For re-use rights please refer to the publisher's terms and conditions.


Publication metadata

Author(s): Olsen SH, O'Neill AG, Bull SJ, Woods NJ, Zhang J

Publication type: Article

Publication status: Published

Journal: Journal of Applied Physics

Year: 2002

Volume: 92

Issue: 3

Pages: 1298-

Date deposited: 15/09/2016

ISSN (print): 0021-8979

ISSN (electronic): 1520-8850

Publisher: American Institute of Physics

URL: http://dx.doi.org/10.1063/1.1489712

DOI: 10.1063/1.1489712


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