Browse by author
Lookup NU author(s): Professor Patrick Briddon
Full text for this publication is not currently held within this repository. Alternative links are provided below where available.
There is a need to understand the degradation mechanism which results in the loss of substitutional C-As shallow accepters in AlAs and GaAs containing high concentrations (greater than or similar to 10(20) cm(-1)) of carbon. The activation energy for the migration of interstitial carbon atoms, C-i, in AlAs and GaAs is calculated using a local-density functional-based method, AIMPRO, to be less than or similar to 1 eV. This model is consistent with a 'kick-out' mechanism being responsible for the observed loss of C-As, and formation of dicarbon defects. Three local minima separated by only a few tenths of an eV are encountered by a diffusing carbon atom along its path through the crystal. These have (C-As)(As) split interstitial, bond-centred M-C-As, and (C-M)(M) split interstitial structures (M = Al, Ga). Interstitial dicarbon defects, (C-C)(i), or substitutional dicarbon defects, (C-C)(As), are produced depending on whether a C-i meets a (C-M)(M) split interstitial or a C-As These possess Raman-active C-C vibrational modes near to that for a free dicarbon molecule, C-2. (C) 1999 Elsevier Science B.V. All rights reserved.
Author(s): Latham CD, Jones R, Haugk M, Frauenheim T, Briddon PR
Publication type: Conference Proceedings (inc. Abstract)
Publication status: Published
Conference Name: ICDS-20: Proceedings of the 20th International Conference on Defects in Semiconductors
Year of Conference: 1999
Library holdings: Search Newcastle University Library for this item
Series Title: Physica B: Condensed Matter