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Measurements of gate-oxide interface roughness in strained-Si virtual substrate SiGe/Si MOSFET device structures

Lookup NU author(s): Dr Sarah Olsen, Professor Anthony O'Neill, Dr Jie Zhang


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Publication metadata

Author(s): Norris DJ, Cullis AG, Olsen SH, O'Neill AG, Zhang J

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: Microscopy of Semiconducting Materials: Conference on Microscopy of Semiconducting Materials

Year of Conference: 2003

Pages: 389-392

ISSN: 0951-3248

Publisher: Institute of Physics Publishing

Library holdings: Search Newcastle University Library for this item

Series Title: Institute of Physics Conference Series

ISBN: 9780750309790


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