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Nanoscale strain characterisation for ultimate CMOS and beyond

Lookup NU author(s): Dr Sarah Olsen, Dr Piotr Dobrosz, Rouzet Agaiby, Dr Yuk Tsang, Layi Alatise, Professor Steve Bull, Professor Anthony O'Neill

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Author(s): Olsen SH, Dobrosz P, Agaiby RMB, Tsang YL, Alatise O, Bull SJ, O'Neill AG, Moselund KE, Ionescu AM, Majhi P, Buca D, Mantl S, Coulson H

Editor(s): Claeys C; Peaker T; Fompeyrine J; Frank M; Vanhellemont J

Publication type: Conference Proceedings (inc. Abstract)

Conference Name: E-MRS 2008 Spring Meeting

Year of Conference: 2008

Pages: 271-278

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Publisher: Materials Science in Semiconductor Processing: Pergamon

URL: http://dx.doi.org/10.1016/j.mssp.2009.06.003

DOI: 10.1016/j.mssp.2009.06.003

Notes: Symposium J: Beyond Silicon Technology: Materials and Devices for Post-Si CMOS Invited presentation

Library holdings: Search Newcastle University Library for this item

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