Lookup NU author(s): Dr Nick Bennett,
Professor Nick Cowern
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Electrical characterization of ultra-shallow junctions, relying on advanced implant and anneal processes, has received much attention in the past few years since conventional characterization methods fail. With continued scaling of semiconductor devices, the problems associated with conventional techniques will become even more evident. In several recent studies micro four-point probe (M4PP) has been demonstrated as a reliable high precision metrology method for both sheet resistance and Hall effect measurements of ultra-shallow implants and has revealed a promising potential for carrier profiling.
Author(s): Petersen DH, Hansen O, Hansen TM, Boggild P, Lin R, Kjaer D, Nielsen PF, Clarysse T, Vandervorst W, Rosseel E, Bennett NS, Cowern NEB
Publication type: Review
Journal: Journal of Vacuum Science & Technology B
Print publication date: 01/01/2010
ISSN (print): 1071-1023
ISSN (electronic): 1520-8567
Notes: Part B. Microelectronics and Nanometer Structures