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The impact of self-heating and SiGe strain-relaxed buffer thickness on the analog performance of strained Si nMOSFETs

Lookup NU author(s): Layi Alatise, Dr Kelvin Kwa, Dr Sarah Olsen, Professor Anthony O'Neill

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Publication metadata

Author(s): Alatise OM, Kwa KSK, Olsen SH, O'Neill AG

Publication type: Article

Journal: Solid-State Electronics

Year: 2010

Volume: 54

Issue: 3

Pages: 327-335

ISSN (print): 0038-1101

ISSN (electronic): 1879-2405

Publisher: Pergamon

URL: http://dx.doi.org/10.1016/j.sse.2009.09.029

DOI: 10.1016/j.sse.2009.09.029


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