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In situ X-ray diffraction study of self-forming barriers from a Cu-Mn alloy in 100 nm Cu/low-k damascene interconnects using synchrotron radiation

Lookup NU author(s): Dr Alton Horsfall, Professor Anthony O'Neill

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Publication metadata

Author(s): Wilson C, Volders H, Croes K, Pantouvaki M, Beyer G, Horsfall A, O'Neill A, Tokei Z

Publication type: Article

Journal: Microelectronic Engineering

Year: 2010

Volume: 87

Issue: 3

Pages: 398-401

ISSN (print): 0167-9317

ISSN (electronic): 1873-5568

Publisher: Elsevier BV

URL: http://dx.doi.org/10.1016/j.mee.2009.06.023

DOI: 10.1016/j.mee.2009.06.023


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