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Design, fabrication and characterisation of strained Si/SiGe MOS transistors

Lookup NU author(s): Dr Sarah Olsen, Dr Kelvin Kwa, Luke Driscoll, Dr Sanatan Chattopadhyay, Professor Anthony O'Neill

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Publication metadata

Author(s): Olsen SH, Kwa KSK, Driscoll LS, Chattopadhyay S, O'Neill AG

Publication type: Article

Journal: IEE Proceedings: Circuits, Devices and Systems

Year: 2004

Volume: 151

Issue: 5

Pages: 431-437

ISSN (print): 1350-2409

ISSN (electronic): 1751-8598

Publisher: The Institution of Engineering and Technology

URL: http://dx.doi.org/10.1049/ip-cds:20040995

DOI: 10.1049/ip-cds:20040995


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