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Effects of interface engineering for HfO2 gate dielectric stack on 4H-SiC

Lookup NU author(s): Dr Rajat Mahapatra, Dr Alton Horsfall, Dr Sanatan Chattopadhyay, Professor Nick Wright

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Publication metadata

Author(s): Mahapatra R, Chakraborty AK, Horsfall AB, Chattopadhyay S, Wright NG, Coleman KS

Publication type: Article

Journal: Journal of Applied Physics

Year: 2007

Volume: 102

Issue: 2

ISSN (print): 0021-8979

ISSN (electronic): 1089-7550

Publisher: American Institute of Physics

URL: http://dx.doi.org/10.1063/1.2756521

DOI: 10.1063/1.2756521


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